Fontaine, Sue: search on Z-Library

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1

The Role of Public Relations in Fund Raising

Journal:

Journal of Library Administration

Year:

1990

Language:

english

File:

PDF, 9.96 MB

english, 1990

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Influence of mask surface roughness on 22nm node extreme ultraviolet lithography

La Fontaine, Bruno M., Kim, Eun-Jin, You, Jee-Hye, Kim, Seoung-Sue, Cho, Han-Ku, Ahn, Jinho, An, Ilsin, Oh, Hye-Keun

Year:

2010

Language:

english

File:

PDF, 2.76 MB

english, 2010

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Printability and inspectability of programmed pit defects on the masks in EUV lithography

La Fontaine, Bruno M., Kang, In-Yong, Seo, Hwan-Seok, Ahn, Byung-Sup, Lee, Dong-Gun, Kim, Dongwan, Huh, Sungmin, Koh, Cha-Won, Cha, Brian, Kim, Seoung-Sue, Cho, Han-Ku, Mochi, Iacopo, Goldberg, Kennet

Year:

2010

Language:

english

File:

PDF, 2.26 MB

english, 2010

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Incident angle change caused by different off-axis illumination in extreme ultraviolet lithography

Kim, Eun-Jin, Schellenberg, Frank M., La Fontaine, Bruno M., You, Jee-Hye, Kim, Seong-Sue, Cho, Han-Ku, An, Ilsin, Oh, Hye-Keun

Year:

2009

Language:

english

File:

PDF, 887 KB

english, 2009

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Seo, Hwan-Seok, Schellenberg, Frank M., La Fontaine, Bruno M., Lee, Dong-Gun, Ahn, Byung-Sup, Han, Hakseung, Huh, Sungmin, Kang, In-Yong, Kim, Hoon, Kim, Dongwan, Kim, Seong-Sue, Cho, Han-Ku

Year:

2009

Language:

english

File:

PDF, 4.83 MB

english, 2009

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Printability and inspectability of defects on the EUV mask for sub-32nm half pitch HVM application

Huh, Sungmin, La Fontaine, Bruno M., Naulleau, Patrick P., Kang, In-Yong, Kim, Sang-Hyun, Seo, Hwan-seok, Kim, Dongwan, Park, Jooon, Kim, Seong-Sue, Cho, Han-Ku, Goldberg, Kenneth, Mochi, Iacopo, Shok

Year:

2011

Language:

english

File:

PDF, 3.38 MB

english, 2011

7

Understanding dementia amongst people in minority ethnic and cultural groups

Jenny La Fontaine, Jyoti Ahuja, Nicola M. Bradbury, Sue Phillips, Jan R. Oyebode

Journal:

Journal of Advanced Nursing

Year:

2007

Language:

english

File:

PDF, 88 KB

english, 2007

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

La Fontaine, Bruno M., Seo, Hwan-Seok, Lee, Dong-Gun, Ahn, Byung-Sup, Koh, Cha-Won, Kang, In-Yong, Kim, Tae Geun, Kim, Hoon, Kim, Dongwan, Kim, Seong-Sue, Cho, Han-Ku

Year:

2010

Language:

english

File:

PDF, 1.57 MB

english, 2010

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